HTCC MLCC Aluminum Nitride Substrate Debinding High Vacuum Furnace
This equipment is a high-temperature vacuum degreasing and sintering integrated furnace specially developed by our company for the aluminum nitride ceramic substrate industry. It has a double-layer water-cooled vacuum shell structure and adopts graphite multi-temperature zone independent temperature control heating. It can perform vacuum and partial pressure degreasing dual modes. The gas adopts a multi-channel horizontal flow design structure, which can make the degreasing and debinding effect better. It is the first choice for the sintering process of producing aluminum nitride substrates.
Chamber size
|
900X500X500mm
1500X500X500mm
|
Design temperature | 2000℃ |
Max temperature |
1850℃
|
Heater | Graphite Rods |
Control accuracy | ±1℃ |
Temperature control method | PID automatic adjustment |
Maximum power | Based on the size |
Ventilation type | Inert gases such as nitrogen and argon |
Lock door structure | Electric door lock structure |
Control system | Touch screen + fully automatic PLC control system |
With proven engineering knowledge and more than 20 years' experience we can provide you the right furnace solution.
We will well pack the goods based on the kinds of furnace and customer's requirement.