HTCC MLCC Aluminum Nitride Substrate Debinding High Vacuum Furnace
This equipment is a high-temperature vacuum degreasing and sintering integrated furnace specially developed by our company for the aluminum nitride ceramic substrate industry. It has a double-layer water-cooled vacuum shell structure and adopts graphite multi-temperature zone independent temperature control heating. It can perform vacuum and partial pressure degreasing dual modes. The gas adopts a multi-channel horizontal flow design structure, which can make the degreasing and debinding effect better. It is the first choice for the sintering process of producing aluminum nitride substrates.
| Chamber size
|
900X500X500mm
1500X500X500mm
|
| Design temperature | 2000℃ |
| Max temperature |
1850℃
|
| Heater | Graphite Rods |
| Control accuracy | ±1℃ |
| Temperature control method | PID automatic adjustment |
| Maximum power | Based on the size |
| Ventilation type | Inert gases such as nitrogen and argon |
| Lock door structure | Electric door lock structure |
| Control system | Touch screen + fully automatic PLC control system |
With proven engineering knowledge and more than 20 years' experience we can provide you the right furnace solution.
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We will well pack the goods based on the kinds of furnace and customer's requirement.
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