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High Vacuum Furnace HTCC MLCC Aluminum Nitride Substrate Debinding

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High Vacuum Furnace HTCC MLCC Aluminum Nitride Substrate Debinding
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Features
Specifications
Chamber Size: Customized
Heater: Graphite Rods
Working Temperature: 1850℃
Control Accuracy: ±1℃
Temperature Control Method: PID
Heating Rate: 《20℃/MIN
Max Power: Customized
OEM: Can
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HTCC high temperature vacuum furnace

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high temperature vacuum furnace HTCC

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MLCC high temperature vacuum furnace

Basic Infomation
Place of Origin: CHINA
Brand Name: QIANJIN
Certification: ISO9001
Model Number: VF
Payment & Shipping Terms
Packaging Details: plywood package
Delivery Time: 30 work days
Supply Ability: 100PCS/month
Product Description

HTCC MLCC Aluminum Nitride Substrate Debinding High Vacuum Furnace

 

1﹑Description

This equipment is a high-temperature vacuum degreasing and sintering integrated furnace specially developed by our company for the aluminum nitride ceramic substrate industry. It has a double-layer water-cooled vacuum shell structure and adopts graphite multi-temperature zone independent temperature control heating. It can perform vacuum and partial pressure degreasing dual modes. The gas adopts a multi-channel horizontal flow design structure, which can make the degreasing and debinding effect better. It is the first choice for the sintering process of producing aluminum nitride substrates.

 

2﹑Technical specification

Chamber size
 
900X500X500mm
1500X500X500mm
Design temperature 2000℃
Max temperature
1850℃
Heater Graphite Rods
Control accuracy ±1℃
Temperature control method PID automatic adjustment
Maximum power Based on the size
Ventilation type Inert gases such as nitrogen and argon
Lock door structure Electric door lock structure
Control system Touch screen + fully automatic PLC control system

 

3﹑Patent

With proven engineering knowledge and more than 20 years' experience we can provide you the right furnace solution.

High Vacuum Furnace HTCC MLCC Aluminum Nitride Substrate Debinding 0

 

4﹑Customer Case in China

 

The first Mobile phone fast charging graphene heat dissipation film carbonization production line

High Vacuum Furnace HTCC MLCC Aluminum Nitride Substrate Debinding 1

The first ITO target powder roller furnace continuous production line in china

High Vacuum Furnace HTCC MLCC Aluminum Nitride Substrate Debinding 2

 

5﹑Foreign Customer

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6﹑Package and shipment

We will well pack the goods based on the kinds of furnace and customer's requirement.

High Vacuum Furnace HTCC MLCC Aluminum Nitride Substrate Debinding 4

 

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Tel : 18521304648
Fax : 86-510-87939955
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